Mask Guidance
Mask guidance in image processing and generation is a rapidly evolving field focused on improving the accuracy and efficiency of image editing and synthesis tasks by incorporating mask information. Current research emphasizes training-free methods using attention mechanisms and diffusion models, particularly within the context of e-commerce image generation and manipulation, leveraging architectures like UNets, ControlNets, and Vision Transformers. These advancements enable more precise control over image editing, leading to higher-quality results and faster inference times, with applications ranging from product image enhancement to improved depth map refinement and even public health monitoring through mask-wearing detection.
Papers
September 15, 2024
September 7, 2024
January 15, 2024
December 8, 2023
November 21, 2023
October 20, 2022
October 16, 2022
June 7, 2022
March 22, 2022
December 30, 2021