Optical Proximity Correction

Optical proximity correction (OPC) is a crucial technology in semiconductor manufacturing that compensates for imperfections in the lithographic process, ensuring accurate chip fabrication at ever-shrinking feature sizes. Current research emphasizes developing faster and more efficient OPC algorithms, focusing on machine learning approaches like reinforcement learning and deep neural networks, often integrated with level-set methods or physics-informed models to improve accuracy and reduce computational cost. These advancements aim to address the increasing complexity of modern chip designs and enable the continued scaling of integrated circuits, ultimately impacting the speed, power efficiency, and cost of electronic devices.