Structured Sparsity

Sparsity is a well-studied technique for compressing deep neural networks (DNNs) without compromising performance. In deep reinforcement learning (DRL), neural networks with up to 5% of their original weights can still be trained with minimal performance loss compared to their dense counterparts. However, most existing methods rely on unstructured fine-grained sparsity, which limits hardware acceleration opportunities due to irregular computation patterns. Structured coarse-grained sparsity enables hardware acceleration, yet typically degrades performance and increases pruning complexity. In this work, we present, to the best of our knowledge, the first study on N:M structured sparsity in RL, which balances compression, performance, and hardware efficiency. Our framework enforces row-wise N:M sparsity throughout training for all networks in off-policy RL (TD3), maintaining compatibility with accelerators that support N:M sparse matrix operations. Experiments on continuous-control benchmarks show that RNM-TD3, our N:M sparse agent, outperforms its dense counterpart at 50%-75% sparsity (e.g., 2:4 and 1:4), achieving up to a 14% increase in performance at 2:4 sparsity on the Ant environment. RNM-TD3 remains competitive even at 87.5% sparsity (1:8), while enabling potential training speedups.

Large language models (LLMs) deliver impressive performance but incur prohibitive memory and compute costs at deployment. Model pruning is an effective way to reduce these overheads, yet existing approaches face challenges: unstructured sparsity, where nonzeros can appear anywhere, preserves accuracy but yields irregular access patterns that prevent GPU acceleration, while semi-structured 2:4 sparsity is hardware-friendly but enforces a rigid 50% pattern that degrades model quality. To bridge this gap, we introduce PATCH, a hybrid sparsity framework that enables a continuous sparsity ratio between 0% and 50%. PATCH partitions weight matrices into tiles, assigning each tile to be either dense or 2:4 sparse via a learnable mask selection mechanism. This design provides fine-grained control over accuracy-acceleration tradeoffs and supports non-uniform sparsity across layers, leading to superior overall quality. Across models from 0.5B to 13B parameters, PATCH consistently narrows the gap to dense accuracy while delivering practical speedups. For instance, on LLaMA-2 7B with an A6000 GPU, PATCH achieves 1.18x-1.38x end-to-end speedup over dense baselines while improving accuracy by 0.37%-2.96% compared to the state-of-the-art 2:4 pruning method, MaskLLM.