physics.opticsApr 1, 2026

Inverse Design of Optical Multilayer Thin Films using Robust Masked Diffusion Models

Authors: Jonas Schaible, Asena Karolin Özdemir, Charlotte Debus, Sven Burger, Achim Streit, Christiane Becker, Klaus Jäger, Markus Götz

Organizations: Department Optics for Solar Energy, Helmholtz-Zentrum für Materialien und Energie GmbH, Berlin, Germany · Zuse Institute Berlin, Berlin, Germany · Scientific Computing Center, Karlsruhe Institute of Technology, Eggenstein-Leopoldshafen, Germany · JCMwave GmbH, Berlin, Germany · Hochschule für Technik und Wirtschaft Berlin, Berlin, Germany · Helmholtz AI, Karlsruhe, Germany

Abstract

Inverse design of optical multilayer stacks seeks to infer layer materials, thicknesses, and ordering from a desired target spectrum. It is a long-standing challenge due to the large design space and non-unique solutions. We introduce OptoLlama, a masked diffusion language model for inverse thin-film design from optical spectra. Representing multilayer stacks as sequences of material-thickness tokens, OptoLlama conditions generation on reflectance, absorptance, and transmittance spectra and learns a probabilistic mapping from optical response to structure. Evaluated on a representative test set of 3,000 targets, OptoLlama reduces the mean absolute spectral error by 2.9-fold relative to a nearest-neighbor template baseline and by 3.45-fold relative to the state-of-the-art data-driven baseline, called OptoGPT. Case studies on designed and expert-defined targets show that the model reproduces characteristic spectral features and recovers physically meaningful stack motifs, including distributed Bragg reflectors. These results establish diffusion-based sequence modeling as a powerful framework for inverse photonic design.

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