Diffuse to Detect: Generative Diffusion Models for Unsupervised IC Anomaly Detection
Authors: Yuxuan Yin, Chen He, Todd Jacobs, Jialei He, Boxun Xu, Robert Jin, Peng Li
Organizations: Department of Electrical and Computer Engineering, University of California Santa Barbara, CA, USA · Automotive Processing, NXP Semiconductors, TX, USA
Latent defect screening is challenged by extremely low failure rates, high-dimensional test data, and absence of labeled anomalies. We propose the first unsupervised anomaly detection framework incorporating a Diffusion Transformer. Raw test measurements are first compressed by an autoencoder, then reshaped into a structured token sequence enriched with sinusoidal and per-device wafer-position embeddings. Anomaly scores are derived from the noise-prediction error over mid-range diffusion timesteps, enabling fast wafer-scale screening without any labeled defects or manual feature engineering. Our approach achieves state-of-the-art performance on industrial 16nm IC test data under extreme class imbalance, offering interpretable failure localization through latent-space reconstruction residuals.
Diffusion models have achieved outstanding performance in unsupervised industrial anomaly detection (uIAD) by learning a manifold of normal data under the common assumption that off-manifold anomalies are harder to generate, resulting in larger reconstruction errors in data space or lower probability densities in the tractable latent space. However, their iterative denoising and noising nature leads to slow inference. In this paper, we propose OSD-IRF, a novel one-step diffusion with inverse residual fields, to address this limitation for uIAD task. We first train a deep diffusion probabilistic model (DDPM) on normal data without any conditioning. Then, for a test sample, we predict its inverse residual fields (IRF) based on the noise estimated by the well-trained parametric noise function of the DDPM. Finally, uIAD is performed by evaluating the probability density of the IRF under a Gaussian distribution and comparing it with a threshold. Our key observation is that anomalies become distinguishable in this IRF space, a finding that has seldom been reported in prior works. Moreover, OSD-IRF requires only single step diffusion for uIAD, thanks to the property that IRF holds for any neighboring time step in the denoising process. Extensive experiments on three widely used uIAD benchmarks show that our model achieves SOTA or competitive performance across six metrics, along with roughly a 2X inference speedup without distillation.
Industrial surface defect detection often suffers from limited defect samples, severe long-tailed distributions, and difficulties in accurately localizing subtle defects under complex backgrounds. To address these challenges, this paper proposes an unsupervised defect detection method that integrates a Denoising Diffusion Probabilistic Model (DDPM) with an asymmetric teacher-student architecture. First, at the data level, the DDPM is trained solely on normal samples. By introducing constant-variance Gaussian perturbations and Perlin noise-based masks, high-fidelity and physically consistent defect samples along with pixel-level annotations are generated, effectively alleviating the data scarcity problem. Second, at the model level, an asymmetric dual-stream network is constructed. The teacher network provides stable representations of normal features, while the student network reconstructs normal patterns and amplifies discrepancies between normal and anomalous regions. Finally, a joint optimization strategy combining cosine similarity loss and pixel-wise segmentation supervision is adopted to achieve precise localization of subtle defects. Experimental results on the MVTecAD dataset show that the proposed method achieves 98.4% image-level AUROC and 98.3% pixel-level AUROC, significantly outperforming existing unsupervised and mainstream deep learning methods. The proposed approach does not require large amounts of real defect samples and enables accurate and robust industrial defect detection and localization. \keywords{Industrial defect detection \and diffusion models \and data generation \and teacher-student architecture \and pixel-level localization}
Industrial anomaly inspection faces a major challenge due to the lack of real-world anomaly samples. While generative models are used to create anomaly data, existing methods still struggle when handling small-scale anomalies. This failure occurs because extreme downsampling in diffusion models causes the information of small anomalies to be lost in the latent space. To address this, we introduce UniScale, a unified training and inference framework for high-fidelity industrial anomaly generation across arbitrary scales. During training, we introduce an Error-Suppressed Multi-Scale Training (EMT) strategy, which enables the model to learn the rich location-aware textures of anomalies, while suppressing upsampling-induced interpolation errors in texture acquisition, ensuring the model is capable of learning small-scale anomalies, while remaining effective for regular scale anomalies. For inference, we propose Generation-then-Fusion Denoising. It decouples anomaly generation from background integration, preventing small anomalies from being overwhelmed. Extensive experiments demonstrate that our method outperforms state-of-the-art competitors in both anomaly generation quality and downstream detection performance. It achieves a relative IS(a) improvement of 45.86% (from 1.81 to 2.64) on VisA and 37.70% (from 1.22 to 1.68) on MVTec AD 2, while also improving the downstream pixel-level IoU by 4.22% on VisA and AUROC by 6.55% on MVTec AD 2. Code is available at https://github.com/HUST-SLOW/UniScale.