EM3M: An Electron Micrograph Dataset for Microstructural Segmentation and Generation
Authors: Nan Wang, Zhiyi Xia, Yiming Li, Siyuan Zhang, Shi Tang, Zuxin Fan, Xi Fang, Haoyi Tao, +2 more
Organizations: DP Technology, Beijing, China
Abstract
Quantitative microstructural characterization is fundamental to materials science, and electron micrographs (EMs) provide indispensable high-resolution insights. However, progress in deep learning-based analysis of EMs has been hampered by the scarcity of large-scale, expert-annotated public datasets. To address this issue, we introduce EM3M, a large-scale and multimodal dataset for instance-level understanding of EMs. EM3M comprises 5,091 high-quality EMs, approximately 3 million instance segmentation annotations, and image-level textual descriptions with disentangled attributes. The dataset is constructed through a rigorous multi-stage curation and validation pipeline, with comprehensive statistical analyses to ensure reliability and reproducibility. Building upon these curated image-text pairs, we further provide a text-to-image diffusion model that serves as a controllable data augmentation engine, demonstrating that synthetic augmentation consistently improves downstream segmentation performance. To establish a systematic benchmark, we evaluate representative instance segmentation methods on EM3M. Our results reveal that conventional detection-based and query-based methods struggle with the extreme instance densities and textural complexities inherent in EMs. We additionally provide an optimized flow-based baseline to facilitate fair comparison and future research. EM3M {Dataset: https://huggingface.co/datasets/UniParser/EM3M}, the generative engine {Generation: https://huggingface.co/UniParser/EM3M-Gen}, and an online demo {Segmentation demo: https://www.bohrium.com/apps/uni-aims} are publicly available to support future research in automated materials analysis.
Advanced semiconductor nodes drastically increased demand for Transmission Electron Microscopy (TEM), yet destructive sample preparation, slow imaging and high costs severely limit the availability of diverse datasets needed for downstream machine learning (ML). Synthetic data generation is becoming essential, but current generative models often miss TEM-specific noise, structural detail, and stochastic variability crucial for evaluation. We present a Denoising Diffusion Probabilistic Model (DDPM) framework for synthetic TEM image generation under extreme data scarcity. A progressive patch-based training strategy scales from low-resolution patches to full images, enabling from-scratch training with only 15 samples. We integrate a custom TrivialAugment adaptation, cross-process domain transfer, classifier guidance, and RePaint-style inpainting, culminating in full-image generation that preserves global structural and spatial relationships in compliance with FAB metrology requirements. Beyond synthesis, we repurpose DDPM feature representations for segmentation, partitioning encoder feature maps to obtain coherent region masks. Our synthetic images achieve up to MS-SSIM > 0.98 and qualitative expert assessment consistent with structural similarity results, facilitating downstream ML training for defect detection, segmentation, and metrology while preserving statistical and physical realism.
Analyzing microstructural defects in transmission electron microscopy (TEM) images, particularly in irradiated metal alloys, is often limited by the availability of high-quality, labeled data. To address this, we introduce a generative data augmentation approach using a mask-conditioned latent diffusion model (LDM) for synthesizing realistic TEM images with controllable, automatically labeled multi-class defect masks. Without requiring manual annotations for generation, our method enables the creation of synthetic image-mask pairs by sampling distributions learned from experimental masks. These generated data were used to augment small experimental datasets of varying sizes (10, 50, and 100 labeled experimental images) to train a Mask Regional Convolutional Neural Network (R-CNN) model for defect detection and classification. Our results show that generative augmentation yields small overall model performance improvements, with up to a 0.02 gain in the harmonic mean of detection and classification F1 scores. However, we also find that the relative contributions to detection and classification improvement depend on the specific train/test data split. These findings highlight the potential of targeted generative models to enhance deep learning performance in data-scarce microscopy-based image quantification tasks.
Vision foundation models have substantially advanced computer vision, enabling state-of-the-art performance in zero- and few-shot settings. They have been successfully applied to biomedical imaging tasks ranging from organ segmentation in computed tomography to cell segmentation in light microscopy. Electron microscopy (EM) is a central modality for analyzing cellular ultrastructure due to its nanometer-scale resolution. However, the application of foundation models in EM has so far been limited to specific organelles, such as mitochondria, largely due to the diversity of segmentation tasks and the scarcity of comprehensively annotated data. As a result, EM segmentation still predominantly relies on supervised learning, requiring extensive manual annotation and limiting ultrastructural analysis. To address this gap, we propose μMatch, a framework for semi-supervised learning and domain adaptation that leverages foundation models. We implement state-of-the-art student-teacher-based methods and evaluate multiple foundation models (SAM, SAM2, μSAM, DINOv2/v3) on challenging EM tasks, including mitochondrion, nucleus, and neurite segmentation. Our results demonstrate consistent improvements over strong baselines and highlight a path toward substantially reducing the annotation effort in EM.