With the rapid advancement of semiconductor technology, Electronic Design Automation (EDA) has become an increasingly knowledge-intensive and document-driven engineering domain. Although large language models (LLMs) have shown strong general capabilities, applying them directly to EDA remains challenging due to limited domain expertise, cross-tool knowledge confusion, and degraded retrieval-augmented generation (RAG) performance after domain training. To address these issues, this paper presents ChipLingo, a systematic training pipeline for domain-adapted LLMs tailored to EDA scenarios. ChipLingo consists of three stages: domain corpus construction with multi-source data curation and QA augmentation, domain-adaptive pretraining with comparisons of different parameter training strategies, and instruction alignment with RAG scenario training under diverse retrieval conditions. We also curate an internal benchmark, EDA-Bench, covering representative EDA tool scenarios, with plans for public release. Experiments show that ChipLingo-8B achieves 59.7% accuracy on EDA-Bench, outperforming the same-scale base model and some larger general-purpose models. ChipLingo-32B reaches 70.02%, approaching leading closed-source commercial models. Further analysis shows that QA augmentation improves domain performance, Partial FT offers a better balance between adaptation and general capability retention than LoRA, and explicit RAG scenario training mitigates the decline in retrieval utilization after domain training. These results demonstrate the practical value of systematic domain training for knowledge-intensive EDA tasks and provide a foundation for future EDA agents and external-knowledge-driven systems.
As chip complexity increases and time-to-market pressures grow, front-end design has become a critical bottleneck in chip development. Recently, Large Language Models (LLMs) have shown great potential in Electronic Design Automation (EDA). Beyond specification understanding, LLMs show the potential to serve as a unified intelligent interface for hardware description language (HDL) generation, testbench construction, and design space exploration. The rise of agentic AI, represented by pioneering systems such as OpenClaw, offers a strategic roadmap for the next generation EDA. From this perspective, this paper discusses the evolution of EDA from localized assistance to autonomous agentic execution. Then, we review representative advances of LLMs in front-end design, focusing on key tasks such as circuit and testbench generation from a shared specification, as well as design quality improvement in established workflows such as high-level synthesis. Finally, we discuss the key challenges and limitations of integrating LLMs into EDA, and outline future opportunities for advancing LLM-enabled front-end design, offering a systematic perspective for researchers interested in leveraging agentic AI technologies for EDA.
Modern chip design relies on electronic design automation (EDA) tools that generate large, heterogeneous artifacts, including source files, scripts, logs, netlists, and reports. Analyzing these artifacts is critical for debugging, optimization, and design-flow understanding, but remains difficult because relevant evidence is often distributed across many artifact types and design stages. Although LLM agents show promise for EDA assistance, existing approaches lack public benchmarks for large-scale cross-artifact analysis and often struggle to ground reasoning in tool-generated evidence. We present EDATracer, an agentic framework for evidence-grounded EDA artifact analysis. EDATracer organizes design artifacts into a knowledge graph paired with a semantic vector index, enabling LLM agents to retrieve evidence across source files, logs, netlists, and reports. We curate an 18.9 GB dataset of 2,787 synthesizable open-source chip designs and introduce a 90-question benchmark spanning factual, statistical, and reasoning tasks. Across evaluated agents, EDATracer achieves the best pass@1 accuracy, outperforming Cursor and Claude Code by 6.4 and 7.2 percentage points on average, while using 2.0-3.2x fewer tokens.
Large language model (LLM)-based agents use Electronic Design Automation (EDA) tools to generate and revise register-transfer-level (RTL) designs under synthesis and verification feedback. Recent methods learn from this feedback by distilling reusable skills from execution traces or by training on rewards derived from EDA-tools. Both methods are typically evaluated on the tasks that produced the experience. Repeated access to benchmark feedback on the same task can reward task-specific revision rather than creating reusable knowledge that transfers. We introduce ChipMEM, a verification-grounded memory layer for EDA agents. It combines cross-task procedural memory with within-trajectory statistical guidance. Its procedural component distills and stores a skill only after it passes synthesis, simulation, or formal checks, rather than relying on model self-assessments. A Bayesian component maintains hierarchical Beta estimates over tool-call outcomes and ranks recovery strategies that succeeded under comparable errors. A common adapter applies the same memory interface to RTL optimization and testbench-generation agents while preserving each domain's tools and acceptance criteria. We measure performance on training tasks and evaluate whether learned skills transfer to unseen tasks. On RTLRewriter-Bench, under matched model and tool settings, ChipMEM produces equivalence-passing outputs on 39/54 scored designs versus 35/54 without memory; on the 49-design short suite, mean area improvement is 8.69% versus 5.66%. On held-out CVDP tasks, ChipMEM with a frozen procedural library achieves 20/20 accepted outcomes versus 18/20 without memory in a single evaluation per setting.