As time-to-market is crucial in the Integrated Circuit (IC) industry, speeding up layout manufacturability verifi-cation is essential. Chemical-Mechanical Polishing (CMP) plays a vital role in IC fabrication but is significantly influenced by Layout-Dependent Effects (LDE). An accurate and efficient CMP model enables design teams to correct surface unevenness before fabrication, reducing costs and accelerating the design phase. However, existing models often rely on Density Step Height (DSH) modeling, which is time-consuming for calibration and requires substantial hardware resources for fine-grained predictions. In this paper, we propose combining the advantages of two surface analysis techniques, White Light Interfer-ometry (WLI) and Atomic Force Microscopy (AFM), to train a deep learning model. This model aims to predict full-chip post-CMP nanotopography with nanometer-scale accuracy. Our deep learning model is based on a Convolutional Neural Network (CNN) and follows a two-step pipeline. The model is trained on each technique separately, resulting in a detailed full-chip CMP model.
As semiconductor technology nodes scale, computational lithography is essential for ensuring yield and performance. However, lithography is a continuous physical process involving mask optimization, optical imaging, resist exposure, and development, which existing models fail to capture. To overcome this limitation, we present LithoDreamer, the first physics-informed World Model (WM) framework for computational lithography, which formulates the ``Layout-Mask-Resist Image-After Development Image (ADI)'' pipeline as a decision-driven multi-step evolution system. LithoDreamer captures feature changes between adjacent states to model stage-specific physics-informed latent spaces, in which it controls process intervention exploration and drives subsequent state transitions. To achieve interpretable intervention optimization without continuous supervision, we propose a contrastive variational optimization paradigm that contrasts the latent differences between intervention paths with variational evolution constraints, guiding the model to generate evolutions consistent with real lithography physics. Experiments show LithoDreamer achieves state-of-the-art performance in forward evolution and inverse planning. Our lithography dataset is publicly available at GitHub (https://github.com/7jiangyq/lithodreamer.git).
As capacitance extraction accuracy of rule-based pattern matching becomes difficult to sustain at advanced nodes, a growing trend emerges to develop deep-learning-based 2D capacitance models. However, existing MLP- and CNN-based methods constrain their input to fixed metal-layer combinations in a specific process node, limiting their usability in practice. Recognizing the inherent similarity between capacitance matrix and the prevailing attention mechanism, we propose AttentionCap, a customized Transformer for capacitance matrix learning, with a Gram representation framework, a physics-aligned symmetric-attention output layer, and a novel normalized Laplacian loss. We also introduce a process-node embedding to enable multi-node learning. Trained on synthetic data, AttentionCap attains 0.67%/3.99% self/coupling-capacitance error on unseen real designs under a multi-layer and multi-node setting, surpassing the CNN-Cap baseline with 4.6×/5.7× lower self/coupling error and 192× faster inference speed. A pretrained AttentionCap accurately transfers to an unseen node with only 5K samples and 4K finetuning steps. With sufficient accuracy on unseen real designs and strong transferability to new process nodes, AttentionCap offers highly practical value for modern EDA workflows. Code and data are available at https://github.com/THU-numbda/AttentionCap.
Jiechen Huang, Hector R. Rodriguez, Dingcheng Yang +3
Chip placement plays an important role in physical design. While generative models like diffusion models offer promising learning-based solutions, current methods have the following limitations: they use random synthetic data for pre-training, require long sampling times, and often result in overlaps due to their dependence on gradient-based solvers during the sampling process. To overcome these issues, we propose FlowPlace, which features mask-guided synthetic data generation, flow-based efficient training with flexible prior injection, and hard constraint sampling for overlap-free layouts. Experiments on OpenROAD and ICCAD 2015 benchmarks show FlowPlace achieves better PPA metrics, 10-50× faster sampling efficiency, and zero overlaps.