Lithography

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3 papers in the last four weeks, with none the four weeks before. 0.0% of all new papers.

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  1. SHRAV: State-Hypothesis-Reason-Action-Verify Framework for Physical Modeling and Inverse Design

    Sep 23, 2026Ziheng Guo, Yang BuGenerative Inverse DesignInverse Design

    ZhangJiang Laboratory

  2. Mined from Scientific Literature: Process Schemas for Atomic Layer Deposition and Etching in Materials Science

    Sep 14, 2026Sameer Sadruddin, Eleni Poupaki, Alex Watkins +5Materials ScienceLithography

    TIB Leibniz Information Centre for Science and Technology, Hannover 30167, Germany · Department of Applied Physics and Science Education, Eindhoven University of Technology, Eindhoven 5600 MB, The Netherlands · Department of Chemistry, University of Warwick, Coventry CV4 7AL, United Kingdom +1

  3. A Two-Mirror Faceted Projection System for EUV Lithography

    Sep 10, 2026Vasiliy A. Es'kin, Egor V. Ivanov, Olga V. MartynovaLithographyExtreme Ultraviolet

    Department of Radiophysics, University of Nizhny Novgorod 23 Gagarin Ave., Nizhny Novgorod 603022, Russia

  4. Neuro-Symbolic Closed-Loop Control of Laser Powder Bed Fusion with an In-Loop Ontology

    Aug 6, 2026Gisuk Hong, Jaebong Cho, Hyunbo ChoLithographyModel Predictive Control

    aDepartment of Industrial and Management Engineering, Pohang University of Science and Technology, 77 Cheongam-ro, Nam-gu, Pohang, 37673, South Korea

  5. LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds

    Aug 4, 2026Huanglong Ji, Botong Zhao, Shujing Lv +1LithographyDiagnostic Benchmark

  6. A Physics-Chemistry-Informed Neural Network (PCINN) for Real-Time Spatial-ALD Coverage Prediction and Reliable Kinetics Inversion

    Jul 31, 2026Ning Hu, Chang Liu, Yunlei Jiang +1KineticsParametric Physics-Informed Neural Network

    School of Mechanical Engineering, Hangzhou Dianzi University, Hangzhou, China · Information Engineering School, Hangzhou Dianzi University, Hangzhou, China

  7. ICDAR 2026 Competition on Information Extraction from Atomic Layer Deposition/Etching (ALD/E) Scientific Figures

    Jul 29, 2026Fahad Ahmed, Sören Auer, Jennifer D'SouzaScientific FigureScientific Discovery

    TIB - Leibniz Information Centre for Science and Technology, Hannover, Germany · L3S Research Center, Leibniz University, Hannover, Germany

  8. Physics-Informed Neural Operator for Warm-Starting Background-Decomposed and Preconditioned PSFD: Enabling Scalable 3-D EUV Mask Simulation

    Jul 28, 2026Doyun Kim, Werner GillijnsLithographyWarm Starts

    IMEC, Kapeldreef 75, 3001 Leuven, Belgium

  9. LithoDreamer: A Physics-Informed World Model for Multi-Stage Computational Lithography

    Jun 25, 2026Yuqi Jiang, Yumeng Liu, Zimu Li +7LithographyPhysics-Informed Learning

    Zhejiang University, No. 38 Zheda Road, Xihu District, Hangzhou, Zhejiang Province, China.

  10. Gradient-based inverse lithography for EUV masks via the waveguide method and a physics-informed neural operator

    Jun 24, 2026Vasiliy A. Es'kin, Egor V. IvanovLithographyExtreme Ultraviolet

    Department of Radiophysics, University of Nizhny Novgorod 23 Gagarin Ave., Nizhny Novgorod 603022, Russia

  11. Design and Fabrication of a Spin Coater with In-Situ Optical Measurement for Soft Thin Films

    Jun 13, 2026Daniel Gliksberg, Jiajie Qiu, Jun Suzuki +1LithographyOptical

    Mechanical Engineering Massachusetts Institute of Technology Cambridge, MA, US · The Japan Steel Works, LTD. Shinagawa, Tokyo, Japan

  12. Physics-informed generative AI for semiconductor manufacturing: Enforcing hard physical constraints in generative models by construction

    Jun 8, 2026Yaser Mike Banad, Sarah SharifSemiconductor ManufacturingLithography

    School of Electrical and Computer Engineering, University of Oklahoma · 3Intelligent Neuromorphic and Quantum Understanding for Innovative Research and Engineering (INQUIRE) Laboratory · 4Material Science and Engineering Program, University of Oklahoma, Norman, OK 73019 USA +1

  13. Failure-Aware Refinement of Vision-Language Model for Lithography Defect Detection

    Jun 8, 2026Pangyun Jeong, Jiyeong Kong, Yuehua Hu +2Defect DetectionLithography

    1HYU-KITECH Joint Department, Hanyang University, Ansan, 15588, Korea · 4Korea Institute of Industrial Technology, Ansan, 15588, Korea · 2Micro/Nano System Department, Korea University, Seoul 02841, Korea +1

  14. LithoGRPO: Fast Inverse Lithography via GRPO Reinforced Flow Matching

    May 29, 2026Yao Lai, Xuyuan Xiong, Zeyue Xue +7LithographyNeural Mask Estimation

    The University of Hong Kong, Hong Kong · University of Cambridge, Cambridge, UK · The Chinese University of Hong Kong, Hong Kong +2

  15. Full-chip CMP modelling based on Fully Convolutional Network leveraging White Light Interferometry

    May 6, 2026Jules Exbrayat, Renan Bouis, Elie Sezestre +4LithographyDeep Learning

    Univ. Grenoble Alpes, CEA, Leti, F-38000 Grenoble, France